Colloidal Silica Suspension 50 nm Alkaline - AKASEL A/S

Colloidal silica suspension for final polishing of metallographic samples. The suspension can be mixed with etchants to enhance the polishing action. Silica concentration 585 g/l Median (50%) 50 nm pH 9.5 - 10.5 Contains anti-drying agent. Shake before use

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Colloidal Silica Suspension 50 nm Alkaline - AKASEL A/S

Colloidal Silica Suspension 50 nm Alkaline - AKASEL A/S

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Maria Freiesleben Jensen – Regnskabsansvarlig – AKASEL A/S